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デュエルビッツ 出金od Formability Copper Alloy CAC™ 60
CDA No. 64760
デュエルビッツ 出金, Excellent stress relaxation resistance and Good bend formability.
Good Points
- Has higher strength than 580MPa, デュエルビッツ 出金an use for small terminals easily.
- Has excellent bend formability in comparison to other Cu-Ni-Si alloys. Offers flexibility in designing for terminals デュエルビッツ 出金onnectors.
- Has excellent stress relaxation resistance. Applicable to SAE class 4.
- Has 44% IACS in electrical conductivity. It maybe suitable for the parts of higher current.
Nominal Compositions
Cu-1.8Ni-0.4Si-1.1Zn-0.1Sn (mass%)
Characteristics
Fig. Stress Relaxation Resistance of CAC™ 60
1. Physical Properties
| Specific Gravity | 8.9 |
|---|---|
| Coefficient of Thermal Expansion (293～573K) |
17.3 x 10-6/K |
| Thermal Conductivity (293K) | 197 W/m.K |
| Electrical Resistivity (293K) | 39.2 nΩ.m |
| Electrical Conductivity (293K) | 44 %IACS |
| Modulus Elasticity (293K) | 127 GPa |
* The above are typical characteristics.
2. Mechanical Properties
| Temper | Tensile Strength MPa |
Yield Strength MPa |
Elongation
% |
Vickers Hardness MHv: 4.9N |
|---|---|---|---|---|
| H | 600～700 | 580 | 10 min | 180～220 |
| EH | 640～740 | 640 | 3 min | 190～230 |
* Yield strength are nominal values.
* The above tensile strength and hardness are our standard specifications.
We will adjust these specifications by your requests.
3. 90°W-type Bend-formability (MBR)
| Temper | Good Way | Bad Way |
|---|---|---|
| H | 0 | 0 |
| EH | 0.5 | 0.2 |
* The above are typical characteristics.
The value slightly varies depending on the thickness of specimens.
Use
Small terminals デュエルビッツ 出金onnectors for Automotive wire harness, Terminals デュエルビッツ 出金onnectors for Consumers, Inner-frame for Heat spreader etc.
Others
Not used cadmium (Cd), lead (Pb), mercury (Hg), six value chrome (Cr+6), polybrominated biphenyl (PBB), Polybrominated biphenyl ether (PBDE) restricted with RoHS etc.
Kobe Steel, Ltd. Advanced Materials Business
Copper Rolled Products Unit
Copper Flat Rolled Products Sales Department
